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Diffusion of some MVOCs through building moisture barriers

Referentgranskad
Komulainen, J.; Lu-Tervola, Xiaoshu; Hakkarainen, H.; Weckström, A.; Viljanen, M.; Liukkonen, S.
-2003

Diffusion barriers in semiconductor contact metallization: Dissertation

Kattelus, Hannu
Technical Research Centre of Finland. Publications1988

Reliability of Tantalum Based Diffusion Barriers between Copper and Silicon

Referentgranskad
Zeng, K.; Kivilahti, J.K.; Molarius, J.; Suni, I.
MATERIALS RESEARCH SOCIETY2000

Reactively sputtered Ta2N and TaN diffusion barriers for copper metallization

Referentgranskad
Molarius, Jyrki; Laurila, Tomi; Riekkinen, Tommi; Zeng, Kejun; Niskanen, Antti; Leskelä, Markku; Sun...
Advanced Metallization Conference2000

Tantalum carbide and nitride diffusion barriers for Cu metallization

Referentgranskad
DOI
10.1016/S0167-9317(01)00582-2
Laurila, Tomi; Zeng, Kejun; Kivilahti, Jorma; Molarius, Jyrki; Riekkinen, Tommi; Suni, Ilkka
Microelectronic Engineering2002

Tantalum carbide and nitride diffusion barriers for Cu metallisation

Referentgranskad
DOI
10.1016/S0167-9317(01)00582-2
Laurila, T.; Zeng, K.; Kivilahti, J. K.; Molarius, J.; Riekkinen, T.; Suni, I.
Microelectronic Engineering2002

Tantalum-based diffusion barriers for copper metallization

Laurila, T.; Zeng, K.; Kivilahti, J.
Teknillinen korkeakoulu1999

Sputtered W-N diffusion barriers

Referentgranskad
Öppen tillgång
DOI
10.1116/1.572901
Kattelus, Hannu; Kolawa, Elzbieta; Affolter, Klaus; Nicolet, Marc
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films1985

Monte-Carlo simulation of diffusion in two barriers system

Referentgranskad
Masin, M.; Chvoj, Z.; Jelinek, P.; Heinonen, J.
Surface Science2002

Data sets of migration barriers for atomistic Kinetic Monte Carlo simulations of Fe self-diffusion

Referentgranskad
Öppen tillgång
DOI
10.1016/j.dib.2018.04.060
Baibuz, Ekaterina; Vigonski, Simon; Lahtinen, Jyri; Zhao, Junlei; Jansson, Ville; Zadin, Vahur; Djur...
Data in Brief2018

Diffusion of some MVOCs through building moisture barriers

Referentgranskad
2003

Diffusion barriers in semiconductor contact metallization: Dissertation

1988

Reliability of Tantalum Based Diffusion Barriers between Copper and Silicon

Referentgranskad
2000

Reactively sputtered Ta2N and TaN diffusion barriers for copper metallization

Referentgranskad
2000

Tantalum carbide and nitride diffusion barriers for Cu metallization

Referentgranskad
DOI
10.1016/S0167-9317(01)00582-2
2002

Tantalum carbide and nitride diffusion barriers for Cu metallisation

Referentgranskad
DOI
10.1016/S0167-9317(01)00582-2
2002

Tantalum-based diffusion barriers for copper metallization

1999

Sputtered W-N diffusion barriers

Referentgranskad
Öppen tillgång
DOI
10.1116/1.572901
1985

Monte-Carlo simulation of diffusion in two barriers system

Referentgranskad
2002

Data sets of migration barriers for atomistic Kinetic Monte Carlo simulations of Fe self-diffusion

Referentgranskad
Öppen tillgång
DOI
10.1016/j.dib.2018.04.060
2018